Pattern formation via a two-step faceting transition on vicinal Si(111) surfaces

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Publication Type Journal Article
School or College College of Engineering
Department Materials Science & Engineering
Creator Liu, Feng
Other Author Men, F. K., Wang, P. J.; Chen, C. H.; Cheng, D. L.; Lin, J. L.; Himpsel, F. J.
Title Pattern formation via a two-step faceting transition on vicinal Si(111) surfaces
Date 2001
Description We demonstrate a self-organized pattern formation on vicinal Si(l 11) surfaces that are miscut toward the [211] direction. All the patterns, consisting of a periodic array of alternating (7x7) reconstructed terraces and step-bunched facets, have the same periodicity and facet structure, independent of the miscut angle; while the width of the facets increases linearly with miscut angle. We attribute such unique pattern formation to a surface faceting transition that involves two transition steps: the first step forms a stress-domain structure defining the universal periodicity; the second step forms the low-energy facets controlling the facet width.
Type Text
Publisher Materials Research Society
Volume 648
First Page P17.1
Last Page P17.6
Subject Pattern formation; Faceting transition; Vicinal Si(111); Miscut
Subject LCSH Surface chemistry
Language eng
Bibliographic Citation Men, F. K., Liu, F., Wang, P. J., Chen, C. H., Cheng, D. L., Lin, J. L., & Himpsel, F. J. (2001). Pattern formation via a two-step faceting transition on vicinal Si(111) surfaces. MRS Proceeding, 648, P1.7.1-6
Rights Management © Materials Research Society http://www.mrs.org/
Format Medium application/pdf
Format Extent 956,938 bytes
Identifier ir-main,12189
ARK ark:/87278/s6988r8s
Setname ir_uspace
ID 703799
Reference URL https://collections.lib.utah.edu/ark:/87278/s6988r8s