Enhanced growth instability of a strained film on wavy substrate

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Publication Type Journal Article
School or College College of Engineering
Department Materials Science & Engineering
Creator Liu, Feng
Other Author Wang, Hangyao; Zhang, Yu
Title Enhanced growth instability of a strained film on wavy substrate
Date 2008
Description We demonstrate that the growth of a strained film is inherently less stable on a wavy substrate than on a flat substrate. For small surface undulation, the lowest strain energy state is for the film surface to adopt the same wavelength as the substrate surface in an antiphase configuration at the early stage of growth. The critical wavelength (λc) of growth instability on a wavy substrate is half of that on a flat substrate (λ0). It increases linearly with increasing film thickness (t) as λc=λ0 /2+πt. Implications for strain directed self-assembly on patterned substrate are discussed.
Type Text
Publisher American Institute of Physics (AIP)
Journal Title Journal of Applied Physics
Volume 104
Issue 5
First Page 54301
DOI 10.1063/1.2968223
citatation_issn 218979
Subject Growth instability; Strained film; Wavy substrate; Strain induced self-assembly
Subject LCSH Strain theory (Chemistry); Thin films
Language eng
Bibliographic Citation Wang, H., Zhang, Y., & Liu, F. (2008). Enhanced growth instability of a strained film on wavy substrate. Journal of Applied Physics, 104(5), 054301.
Rights Management (c)American Institute of Physics. The following article appeared in Wang, H., Zhang, Y., & Liu, F., Journal of Applied Physics, 104(5), 2008 and may be found at http://dx.doi.org/10.1063/1.2968223
Format Medium application/pdf
Format Extent 238,876 bytes
Identifier ir-main,12116
ARK ark:/87278/s6ks796s
Setname ir_uspace
ID 707435
Reference URL https://collections.lib.utah.edu/ark:/87278/s6ks796s